Plasma Processing for III-V Materials

Pere Roca i Cabarrocas, pere.roca@polytechnique.edu François Silva, francois.silva@polytechnique.edu In last twenty years, researchers at LPICM have been deeply invested in the field of low temperature plasma epitaxy, addressing both plasma / material fundamental aspects, including ab initio molecular dynamics modelling, and applications of silicon for PV and microelectronics. These studies have been limited so far […]

Selective Area Deposition for Microelectronics

Introduction – A Novel Process Work is underway at the LPICM to invent and study techniques to produce Area Selective Deposition (where a film grows on one type of surface but not on another).  While this phenomenon is under investigation using Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD), we are investigating the use […]